Equipment Details

Nano-patterning in various application areas

Patterning performance

• Minimum structure size 20 nm
• Minimum lines and spaces (half pitch) 30 nm
• Writing field size (XY) 60 μm x 60 μm
• Write speed (50 nm pixel) 500 μm²/min

Imaging performance

• Lateral imaging resolution (feature size) 10 nm
• Vertical resolution (topography sensitivity) <0.5 nm  

System features

• Substrate sizes  1 x 1 mm² to 100 x 100 mm²