Equipment Details

NanoFrazor
NANOFRAZOR SCHOLAR
Lithography
Photo lithography
Heidelberg Instruments

Nano-patterning in various application areas

Patterning performance

  • Minimum structure size 20 nm
  • Minimum lines and spaces (half pitch) 30 nm
  • Writing field size (XY) 60 μm x 60 μm
  • Write speed (50 nm pixel) 500 μm²/min

Imaging performance

  • Lateral imaging resolution (feature size) 10 nm
  • Vertical resolution (topography sensitivity) <0.5 nm  

System features

  • Substrate sizes  1 x 1 mm² to 100 x 100 mm²
Zscharschuch, Jens
T: (0351) 260 3706 / 463 32448
FAM 346

Back to list